Helmut-Fischer FISCHERSCOPE® XDV®

Helmut-Fischer FISCHERSCOPE® XDV®

Innovative benchtop instrument for coating thickness measurement of very thin and complex coatings, even < 0.05 μm.

Speed meets precision.

Built for maximum speed, highest precision, and intuitive ease of use – that’s how we introduce the new generation of XRF instruments with our FISCHERSCOPE® XDV®. As one of our high-end XRF solutions, the instrument is designed for measuring on microstructures with confidence. Combined with our cutting-edge FISIQ® X software, the device delivers outstanding measuring performance. In addition, simplified and efficient workflows ensure smooth measurement processes and significantly increased throughput in your quality control.

  • Super-fast sample positioning.

High-speed Z-axis 6 x faster*

  • Rapid sample capture.

Autofocus in under 2 seconds – 14 x faster*

  • Automated operation.

Automated or manual hood for maximum flexibility

  • Optimum sample illumination and picture capture.

10 x higher* camera resolution and multizone LED lighting

* In comparison to FISCHERSCOPE® X-RAY XDV®-SDD.

  • Unparalleled high precision and repeatable results.

Optimized measurement geometry

  • Device status always visible.

Intuitive 180° status light

  • Enhanced usability and user guidance.

New FISIQ® X software

  • Microfocus tube with tungsten anode, other anodes available on request
  • Silicon drift detector 50 mm² for highest precision on thin layers
  • Automated hood and programmable measuring table for automated measurements
  • 4-fold changeable apertures and 6-fold changeable filters
  • Individual approval as fully protected instrument
  • FISIQ® X software with AI-supported spectrum mode for smarter measurement processes
  • Stepless measuring distance with measuring top down
  • Up to 140 mm possible heights of samples
  • Analysis of very thin coatings, e.g., gold/palladium coatings of ≤ 50 nm (0.002 mils)
  • Measurements of functional coatings in the electronics and semiconductor industries, e.g. determination of the coating thickness of gold layers down to 2 nm (0.00008 mils) for lead frames
  • Measurement of ultra-thin coatings on silicon wafers
  • Determination of light element coatings on wafers (Al, Ti, NiP)
  • Fuel cell and battery foils: metals (Pt, Ir, Ce; Ni, Co, Mn) in organic matrix (carbon)
  • Gold analysis with highest requirements
  • Measurement of complex multilayer systems
  • Automated measurements, e.g. in quality control